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ESMC Breaks Ground on €10 Billion Semiconductor Fab in Dresden

ESMC, a joint venture between TSMC, Robert Bosch GmbH, Infineon Technologies AG, and NXP Semiconductors N.V., has officially begun the initial phase of land preparation for its first semiconductor fab in Dresden, Germany. The groundbreaking ceremony, held on August 20, 2024, marked a significant milestone in the establishment of the EU’s first FinFET-capable pure-play foundry. The event was attended by prominent figures including European Commission President Ursula von der Leyen and German Chancellor Olaf Scholz.

The new facility is expected to produce 40,000 300mm wafers per month using TSMC’s advanced 28/22 nanometer planar CMOS and 16/12 nanometer FinFET process technologies. This €10 billion investment, supported by the European Union and the German government, will not only enhance Europe’s semiconductor manufacturing capabilities but also create around 2,000 high-tech jobs and stimulate numerous indirect jobs across the EU supply chain. The fab will be built with a focus on sustainability, aiming for energy-efficient construction and LEED certification.

Key Points:

“Together with our partners, Bosch, Infineon, and NXP, we are building our Dresden facility to meet the semiconductor needs of the rapidly growing European automotive and industrial sectors,” said TSMC Chairman & CEO C.C. Wei.

“The construction of another semiconductor manufacturing facility in Dresden by ESMC constitutes a major success for the region,” said Infineon Technologies AG CEO Jochen Hanebeck.

“Today marks a historic milestone for the German and European microelectronics industry,” said NXP President and CEO Kurt Sievers.

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