Netherlands-based ASML, a leading provider of lithography systems for the semiconductor industry, agreed to acquire Taiwan-based Hermes Microvision, a leading supplier of pattern verification systems used for advanced semiconductor devices, in a cash transaction valued at about TWD 100 billion (approximately EUR 2.75 billion).
The two companies are leaders in their respective fields and have been working together on new approaches that IC manufacturers can use to improve yields in the production of the most advanced microchips as they enter sub-10 nanometer resolutions and 3D integration. This requires very dense, high resolution metrology to measure and control device performance, whereas 3D integration requires very dense, high voltage contrast metrology for process control.
“Our over-arching goal is to serve our customers even better and offer them the tools they need to achieve higher yields at the most advanced nodes. This acquisition is intended to make a strong product offering even stronger. Our metrology technologies are complementary, and when combined offer the chance to significantly improve process control, and hence yields, for our customers. Our two companies have worked together for almost two years to see how we could best combine our capabilities, and found that we could significantly improve this constructive cooperation and better serve our customer by teaming up as one company. This also means that we expect enhanced product offerings faster,” said Peter Wennink, President and Chief Executive Officer at ASML.
